Image processing and analysis for technical vision systems in the microelectronics industry
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Image processing and analysis for technical vision systems in the microelectronics industry

Processing tasks:

data preparation and quality control of technological operations for the manufacture of photomasks and semiconductor VLSI wafers.

Scientific and technical groundwork.

A number of software complexes (SCs) that work in conjunction with devices for automatic control of semiconductor wafers defectiveness have been developed (JSC "KBTEM-OMO" SSPA "Planar" http://kb-omo.by/, www.planar.by).

The SC for preparing topological data provides the conversion of files from CAD formats to the format of specialized technological equipment produced by VLSI: image generators and automatic control units for semiconductor wafers and photomasks. It supports:

  • the MEBES, CIF, DXF, ZBA-20 and Gerber, GDSII formats and the format of the installation for monitoring the defectiveness of photomasks of JSC "KBTEM-OMO" SSPA "Planar" http://kb-omo.by/, www.planar.by;
  • parsing of the installation topological data;
  • cutting contours into primitives;
  • scaling of topology elements;

The SC for technological operations quality control implements control methods:

  • comparison with design data (die-to-database or die-to-die);
  • comparison of images in transmitted and reflected light;
  • presentation of defects to the operator in transmitted and reflected light on the monitor screen, the ability to classify defects.

The SC for preparing data for widespread image single-channel generators covers arbitrary shapes with a minimum number of rectangles, taking into account technological limitations, and generates a program for the generator.

The SC for preparing input data for the widespread image laser generator forms an image according to the principle of microphotosetting.

The generator is designed for the manufacture of metallized photomasks in the production of integrated circuits, semiconductor devices, hybrid circuits, photoelectric converters, LCD displays, precision printed circuit boards, special measuring and test templates for both production and research and educational purposes.

The SC for modeling images for photolithography is designed to determine possible defects in the production of VLSI, including hidden ones. Modeling the lithography process is represented by two stages:

1) masks are projected into the photoresist in the form of an air image*;

2) 3D shapes of the photoresist are designed and structured according to the image intensity.

         * - the first stage has been implemented.