Image modeling SC for photolithography

Designed to identify possible defects in the production of VLSI, including hidden ones. Modeling the lithography process is represented by two stages:

1) masks are projected into the photoresist in the form of an aerial image;

2) 3D shapes of the photoresist are designed and structured according to the image intensity.

The SC includes the following software tools: image modeling on the photoresist surface; distributed and remote data processing in a multiprocessor system; visualization of simulation results; analysis, classification and correction of topology defects.